Overview

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Total Equity Funding
$21.66M in 2 Rounds from 3 Investors
Most Recent Funding
$12.66M Private Equity on October 7, 2011
Headquarters:
San Jose, CA
Description:
D2S designs and develops software and IPs that facilitate direct write e-beam lithography for the production of SoC integrated circuits.
Categories:
Semiconductor, Software, Manufacturing
Website:
http://www.design2silicon.com
Social:

Company Details

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Founded:
2007
Aliases:
Direct2Silicon
Contact:
408-781-9017
Employees:
11 - 50 | None found in Crunchbase

D2S designs and develops software and IPs that facilitate direct write e-beam lithography for the production of SoC integrated circuits. Its platform maximizes existing eBeam technology to reduce mask costs for both low- and high-volume applications.

D2S TrueMask solutions enable advanced photomask designs at 28-nm-and-below process nodes using complex shapes for superior wafer quality but within practical write-times using existing eBeam mask writing equipment.

D2S is based in San Jose, California.

Funding Rounds (2) - $21.66M

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DateAmount / RoundValuationLead InvestorInvestors
Oct, 2011$12.66M / Private Equity1
Apr, 2009$9M / Series B2

Board Members and Advisors (1)

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News (2)

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DateNews
Aug 29, 2013SEC - SEC FORM D
Apr 2, 2009Venture Beat - Direct2Silicon nabs $9M to lower cost of chip production

Offices/Locations (1)

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  • Office

    4040 Moorpark Ave. #250

    San Jose, CA 95117

    USA

Images (1)

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