D2S designs and develops software and IPs that facilitate direct write e-beam lithography for the production of SoC integrated circuits. Its platform maximizes existing eBeam technology to reduce mask costs for both low- and high-volume applications.
D2S TrueMask solutions enable advanced photomask designs at 28-nm-and-below process nodes using complex shapes for superior wafer quality but within practical write-times using existing eBeam mask writing equipment.
D2S is based in San Jose, California.
Funding Rounds (2) - $21.66MUpdate
|Aug 29, 2013||SEC - SEC FORM D|
|Apr 2, 2009||Venture Beat - Direct2Silicon nabs $9M to lower cost of chip production|
4040 Moorpark Ave. #250
San Jose, CA 95117